Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N-2 plasma

Abstract

Silicon nitride (Si3N4) films have received great attention not only as dielectric materials for the gate dielectric of transistors and the insulator of capacitors, but also as a buffer layer and etch-stop layer for the semiconductor industry. As the applications of Si3N4 film increase, the necessity of investigating a novel deposition process applicable at low temperature has emerged. In this regard, the plasma-enhanced atomic layer deposition (PEALD) technique is attractive as a promising process; however, the Si3N4 film deposition process at growth temperatures less than 150 degrees C using PEALD has not been investigated. In this work, the growth behavior and chemistry of SiNx (x < 1.33) film deposited by the PEALD process at various growth temperatures were developed. Insufficient thermal energy from low growth temperature induces an unstable chemical state of deposited film due to the remaining unreacted ligand of adsorbed precursors. This state results in a further chemical reaction to SiO2 formation by air exposure. Other chemical effects depending on chemical composition and electrical property were also examined in detail.