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dc.contributor.author유창식-
dc.date.accessioned2019-11-27T19:42:59Z-
dc.date.available2019-11-27T19:42:59Z-
dc.date.issued2017-07-
dc.identifier.citationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v. 17, no. 3, page. 458-464en_US
dc.identifier.issn1598-1657-
dc.identifier.issn2233-4866-
dc.identifier.urihttp://koreascience.or.kr/article/JAKO201719558339631.page-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/114961-
dc.description.abstractA magnetic tunnel junction (MTJ) based ternary content addressable memory (TCAM) is proposed which provides non-volatility. A unit cell of the TCAM has two MTJ's and 4.875 transistors, which allows the realization of TCAM in a small area. The equivalent resistance of parallel connected multiple unit cells is compared with the equivalent resistance of parallel connected multiple reference resistance, which provides the averaging effect of the variations of device characteristics. This averaging effect renders the proposed TCAM to be variation-tolerant. Using 65-nm CMOS model parameters, the operation of the proposed TCAM has been evaluated including the Monte-Carlo simulated variations of the device characteristics, the supply voltage variation, and the temperature variation. With the tunneling magnetoresistance ratio (TMR) of 1.5 and all the variations being included, the error probability of the search operation is found to be smaller than 0.033-%.en_US
dc.description.sponsorshipThis work was supported by the Ministry of Trade, Industry, and Energy (MOTIE) of Korea and the Korean Semiconductor Research Consortium through the Future Semiconductor Device Technology Development Program under Grant 10044608en_US
dc.language.isoen_USen_US
dc.publisherIEEK PUBLICATION CENTERen_US
dc.subjectTernary content addressable memory (TCAM)en_US
dc.subjectcontent addressable memory (CAM)en_US
dc.subjectmagnetic tunnel junction (MTJ)en_US
dc.titleVariation-tolerant Non-volatile Ternary Content Addressable Memory with Magnetic Tunnel Junctionen_US
dc.typeArticleen_US
dc.relation.no3-
dc.relation.volume17-
dc.identifier.doi10.5573/JSTS.2017.17.3.458-
dc.relation.page458-464-
dc.relation.journalJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.contributor.googleauthorCho, Dooho-
dc.contributor.googleauthorKim, Kyungmin-
dc.contributor.googleauthorYoo, Changsik-
dc.relation.code2017011265-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidcsyoo-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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