Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김현우 | - |
dc.date.accessioned | 2019-11-26T01:35:20Z | - |
dc.date.available | 2019-11-26T01:35:20Z | - |
dc.date.issued | 2017-06 | - |
dc.identifier.citation | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v. 68, page. 245-251 | en_US |
dc.identifier.issn | 1369-8001 | - |
dc.identifier.issn | 1873-4081 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S1369800117305802?via%3Dihub | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/114405 | - |
dc.description.abstract | We have deposited very low resistant Co films on SiO2-coated Si substrates using UV pulsed laser pyrolytic decomposition of Co-2(CO)(8) with 355 nm laser radiation at atmospheric pressure. Facile decomposition of the precursors and the use of Ar curtain enable the deposition of relatively pure Co (with O less than 7% and negligible C) at the power of 1.11-3.33 W, and of pure Co at 6.67 W. The resistivity decreases from 58 to 19 mu Omega-cm as the power increases from 2.22 to 3.33 W, showing inverse-linear dependence on grain size. In addition, further increase of the power to 6.67 W decreases the resistivity to 9 mu Omega-cm, due to both the growth of large grains with negligible contaminants, and the adverse effect of surface roughness. The effects of oxygen contaminants on the resistivity can be minimal, because of its presence in the form of oxide. These low resistant fine metal lines deposited by a direct-writing laser chemical vapor deposition technique at atmospheric pressure have been reported for the first time. | en_US |
dc.description.sponsorship | This work was supported by the Korea Evaluation Institute of Industrial Technology (KEIT), funded by the Ministry of Trade, Industry and Energy (10050932); the Leading Foreign Research Institute Recruitment Program through the National Research Foundation (NRF) of Korea, funded by the Ministry of Science, ICI & Future Planning (MSIP) (2013K1A4A3055679); and a National Research Foundation (NRF) of Korea grant, funded by the Korean Government (MSIP) (2015R1A5A7037615). | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | ELSEVIER SCI LTD | en_US |
dc.subject | Atmospheric laser chemical vapor deposition (ALCVD) | en_US |
dc.subject | Co-2(CO)(8) | en_US |
dc.subject | Low resistivity | en_US |
dc.subject | Grain size | en_US |
dc.subject | Oxygen contamination | en_US |
dc.subject | Direct writing | en_US |
dc.title | Synthesis of highly conductive cobalt thin films by LCVD at atmospheric pressure | en_US |
dc.type | Article | en_US |
dc.relation.volume | 68 | - |
dc.identifier.doi | 10.1016/j.mssp.2017.06.032 | - |
dc.relation.page | 245-251 | - |
dc.relation.journal | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | - |
dc.contributor.googleauthor | Jeong, Kyunghoon | - |
dc.contributor.googleauthor | Lee, Jiwon | - |
dc.contributor.googleauthor | Byun, Injae | - |
dc.contributor.googleauthor | Seong, Myung-jun | - |
dc.contributor.googleauthor | Park, Jongsoo | - |
dc.contributor.googleauthor | Kim, Hyoun Woo | - |
dc.contributor.googleauthor | Kim, Moon J. | - |
dc.contributor.googleauthor | Kim, Jae-Hun | - |
dc.contributor.googleauthor | Lee, Jaegab | - |
dc.relation.code | 2017001037 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | hyounwoo | - |
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