Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 정진욱 | - |
dc.date.accessioned | 2019-11-25T05:14:28Z | - |
dc.date.available | 2019-11-25T05:14:28Z | - |
dc.date.issued | 2017-05 | - |
dc.identifier.citation | PHYSICS OF PLASMAS, v. 24, no. 5, Article no. 053510 | en_US |
dc.identifier.issn | 1070-664X | - |
dc.identifier.issn | 1089-7674 | - |
dc.identifier.uri | https://aip.scitation.org/doi/10.1063/1.4982815 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/114100 | - |
dc.description.abstract | The two-dimensional temporal behavior of plasma was investigated at the wafer-level when applied power was turned on/off, which is one cycle of the pulsed plasma. For the measurement of transient plasma, the floating harmonic method and a post-processing method were used to obtain the ion flux and the electron temperature with a 1 ms time resolution. The results show that the transient behaviors of plasma such as antenna power absorption are observed in pulsed inductively coupled plasma. Antenna-shaped ion flux is observed when the power is turned on, and the radial profiles of the ion flux are followed by a diffusion solution when the power is turned off. Furthermore, the electron temperature shows pulsed plasma characteristics. Published by AIP Publishing. | en_US |
dc.description.sponsorship | This work was supported by the Converging Research Center Program (NRF-2014M3C1A8053701), the National R&D Program (NRF-2014M1A7A1A03045185), the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (NRF-2017R1A2B4009770), and the development of the future semiconductor device Program of MOTIE/KSRC (10052861). | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | AMER INST PHYSICS | en_US |
dc.subject | HIGH-DENSITY | en_US |
dc.subject | BOMBARDMENT | en_US |
dc.subject | ARGON | en_US |
dc.subject | PROBE | en_US |
dc.title | Temporal evolution of two-dimensional electron temperature and ion flux on a substrate in a pulsed-power inductively coupled plasma | en_US |
dc.type | Article | en_US |
dc.relation.no | 5 | - |
dc.relation.volume | 24 | - |
dc.identifier.doi | 10.1063/1.4982815 | - |
dc.relation.page | 1-7 | - |
dc.relation.journal | PHYSICS OF PLASMAS | - |
dc.contributor.googleauthor | Park, Il-seo | - |
dc.contributor.googleauthor | Kim, Dong-Hwan | - |
dc.contributor.googleauthor | Kim, Kyung-Hyun | - |
dc.contributor.googleauthor | Chung, Chin-Wook | - |
dc.relation.code | 2017001875 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF ELECTRICAL AND BIOMEDICAL ENGINEERING | - |
dc.identifier.pid | joykang | - |
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