Highly Dispersed Fe3+-Substituted Colloidal Silica Nanoparticles for Defect-Free Tungsten Chemical Mechanical Planarization
- Title
- Highly Dispersed Fe3+-Substituted Colloidal Silica Nanoparticles for Defect-Free Tungsten Chemical Mechanical Planarization
- Author
- 백운규
- Keywords
- RESONANCE RAMAN-SPECTROSCOPY; PARTICLE-SIZE; CHARGE-DENSITY; ADSORPTION; IRON; SLURRIES; STABILITY; FRAMEWORK; ZEOLITES; BEHAVIOR
- Issue Date
- 2017-05
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v. 6, no. 7, page. P405-P409
- Abstract
- Silica nanoparticles (NPs) are used as abrasives for tungsten chemical mechanical planarization (CMP) at acidic pH. However, the use of silica NPs at pH near their isoelectric point remains a problem because agglomeration due to low surface charge leads to defects on the tungsten surface during CMP. Herein, we report a simple strategy to increase the surface charge of silica NPs at acidic pH for defect-free tungsten CMP. The isomorphic substitution of Si4+ by Fe3+ ions on the surface of silica NPs by hydrothermal reaction led to a pH-independent permanent negative surface charge, which increased as the concentration of substituted Fe3+ ions increased. At acidic pH, the increased negative surface charge of Fe3+-substituted silica (Fe-silica) NPs resulted in a reduction in the number of agglomerated large particles relative to that of pure silica NPs. As a result, highly negatively-charged Fe-silica NPs showed high performance in the reduction of defect count on the tungsten surface after CMP. (C) 2017 The Electrochemical Society. All rights reserved.
- URI
- http://jss.ecsdl.org/content/6/7/P405https://repository.hanyang.ac.kr/handle/20.500.11754/113984
- ISSN
- 2162-8769
- DOI
- 10.1149/2.0171707jss
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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