Atomic layer deposition: A versatile method to enhance TiO2 nanoparticles interconnection of dye-sensitized solar cell at low temperature
- Title
- Atomic layer deposition: A versatile method to enhance TiO2 nanoparticles interconnection of dye-sensitized solar cell at low temperature
- Author
- 고민재
- Keywords
- Dye-sensitized solar cell; Atomic layer deposition; Low temperature process; Titanium dioxide; Interparticles connection
- Issue Date
- 2019-05
- Publisher
- ELSEVIER SCIENCE INC
- Citation
- JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v. 73, Page. 351-356
- Abstract
- A thin TiO2 layer is introduced by atomic layer deposition (ALD) onto the surface of TiO2 host-particles at low-temperature, which serves as binding layer to enhance the interconnection of TiO2 host-nanoparticles of photoelectrode or adhesion of photoelectrode with substrate. The power conversion efficiency of 4.63%, corresponding to 50% enhancement compared with 3.09% of reference cell, is achieved from ALD-treated cell. The electrochemical impedance spectroscopy confirms the reduced internal resistance and much longer electron lifetime in ALD-treated cell. These results suggest that ALD technique can be used as an effective and precise technique to construct efficient dye-sensitized solar cells at low-temperature. (C) 2019 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
- URI
- https://www.sciencedirect.com/science/article/pii/S1226086X19300577?via%3Dihubhttps://repository.hanyang.ac.kr/handle/20.500.11754/111220
- ISSN
- 1226-086X; 1876-794X
- DOI
- 10.1016/j.jiec.2019.02.006
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > CHEMICAL ENGINEERING(화학공학과) > Articles
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