Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이정호 | - |
dc.date.accessioned | 2019-09-02T02:36:41Z | - |
dc.date.available | 2019-09-02T02:36:41Z | - |
dc.date.issued | 2005-01 | - |
dc.identifier.citation | THIN SOLID FILMS, v. 472, No. 1-2, Page. 317-322 | en_US |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S004060900401003X | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/110077 | - |
dc.description.abstract | The annealing of two different film stacks, i.e., HfOx/Si and Hf/SiO2/Si, was investigated in situ in an ultrahigh vacuum by using scanning tunneling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). Although a kinetic metastability in the incongruently melting compounds such as HfO2 was reported to form SiO2 and HfO2 separately at the interface with Si, interfacial silicates (Hf-O-Si bonding units) were grown irrespective of film stacks. Ternary phase consideration in the Hf-Si-O system suggests that many nonstoichiometric silicates can be formed from the solid solutions of various compositions. The presence of nonstoichiometric silicates is ascertained by the STM results that show vagueness between oxygen-poor silicates and oxygen-containing silicides. (C) 2004 Elsevier B.V. All rights reserved. | en_US |
dc.description.sponsorship | The author would like to thank Prof. Masakazu Ichikawa and Dr. Alexander Shklyaev for helpful discussions and technical assistance on STM measurement. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | ELSEVIER SCIENCE SA | en_US |
dc.subject | hafnium | en_US |
dc.subject | scanning tunneling microscopy | en_US |
dc.subject | X-ray photoelectron spectroscopy | en_US |
dc.subject | interfaces | en_US |
dc.title | Ternary phase analysis of interfacial silicates grown in HfOx/Si and Hf/SiO2/Si systems | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.tsf.2004.07.060 | - |
dc.relation.journal | THIN SOLID FILMS | - |
dc.contributor.googleauthor | Lee, JH | - |
dc.relation.code | 2011209470 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF ENGINEERING SCIENCES[E] | - |
dc.sector.department | DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING | - |
dc.identifier.pid | jungho | - |
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