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dc.contributor.author송윤흡-
dc.date.accessioned2019-03-15T00:47:33Z-
dc.date.available2019-03-15T00:47:33Z-
dc.date.issued2016-11-
dc.identifier.citation2016년 대한전자공학회 추계학술대회 논문집, Page. 219-222en_US
dc.identifier.urihttp://www.dbpia.co.kr/Journal/ArticleDetail/NODE07071419-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/100825-
dc.description.abstractIn this paper, we investigated the threshold voltage (VT) dispersion and on-current in poly-GaAs used for a channel material in 3D NAND flash memory. Using simulation, stings of NAND flash memory with 12, 24, 36, and 48 cells were implemented and electrical properties were extracted. It is revealed that the on-current in poly-GaAs channel is larger than in poly-Si channel due to the difference in mobility. In addition, the VT dispersion tends to decrease as the numbers of stacked layers increase in case of poly-GaAs channel.en_US
dc.description.sponsorship이 논문은 2016년도 정부(미래창조과학부)의 재원으로 한국연구재단-나노․소재기술개발사업의 지원을 받아 수행된 연구임(NRF-2016M3A7B4910398)en_US
dc.language.isoko_KRen_US
dc.publisher대한전자공학회en_US
dc.titlePoly-GaAs 채널을 갖는 3D NAND flash memory 전기적 특성 연구en_US
dc.title.alternativeA investigation on electrical properties of poly-GaAs channel in 3D NAND flash memoryen_US
dc.typeArticleen_US
dc.relation.page1-4-
dc.relation.journal전자공학회지-
dc.contributor.googleauthor한성종-
dc.contributor.googleauthor오영택-
dc.contributor.googleauthor송윤흡-
dc.contributor.googleauthorHan, Sung-Jong-
dc.contributor.googleauthorOh, Young-Taek-
dc.contributor.googleauthorSong, Yun-Heub-
dc.relation.code2012220550-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidyhsong2008-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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