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Showing results 201 to 220 of 352

Issue DateTitleAuthor(s)
2013-05Investigation of Source-Based Scratch Formation During Oxide Chemical Mechanical Planarization박진구
2008-08Investigation of Surface Layer Formation for Fluorinated Carbon Film Using Fourier Transform Infrared Spectrometry Analysis박진구
2021-04Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning박진구
2006-02IPA 저온 접합법을 이용한 PMMA micro CE chip의 제작박진구
2006-11Large scale directed assembly of nanoparticles using nanotrench templates박진구
2015-02Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates박진구
2015-03Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates박진구
2003-02Laser Shock Removal of Micro and Nanoscale Particles박진구
2005-07Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks박진구
2012-12Material removal mechanism of single and polycrystalline silicon in alkaline slurry박진구
2015-04Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography박진구
2015-08Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography박진구
2021-02Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process박진구
2021-03Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning박진구
2006-09Metal CMP 용 컨디셔너 디스크 표면에 존재하는 다이아몬드의 형상이 미치는 패드 회복력 변화박진구
2017-12Metal Surface Chemical Composition and Morphology박진구
2016-12Modification of DHF for removal of metals from silicon wafer박진구
2013-04Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP박진구
2013-04Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP박진구
2015-03Multi-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reduction박진구

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