Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안진호 | - |
dc.date.accessioned | 2018-08-20T04:45:52Z | - |
dc.date.available | 2018-08-20T04:45:52Z | - |
dc.date.issued | 2016-07 | - |
dc.identifier.citation | OPTICS EXPRESS, v. 24, NO. 11, Page. 2055-2062 | en_US |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | https://www.osapublishing.org/oe/abstract.cfm?uri=oe-24-11-12055 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/74430 | - |
dc.description.abstract | The imaging performance of a half-tone phase shift mask (PSM) has been analyzed using coherent scattering microscopy (CSM), which allows analysis of the actinic characteristics of an extreme ultraviolet (EUV) mask such as its reflectivity, diffraction efficiency, and phase information. This paper presents the 1st experimental result showing the effect of 180 degrees phase difference between the absorber and reflector in EUV mask. This reveals that a PSM offers a 46% improvement in 1st/0th diffraction efficiency and 14% improvement in image contrast when compared to a binary intensity mask (BIM). The horizontal-vertical critical dimension (H-V CD) bias is also reduced by 1.37 nm at 22 nm line and space (L/S) patterns. Since the performance of PSM can be evaluated without a wafer patterning process, CSM is expected to be a useful inspection tool for the development of novel EUV masks. (C) 2016 Optical Society of America | en_US |
dc.description.sponsorship | This work was supported by the Basic Science Research Program through the National Research Foundation of South Korea (NRF), as funded by the South Korean government (MSIP) (Grant No. 2011-0028570). | en_US |
dc.language.iso | en | en_US |
dc.publisher | OPTICAL SOC AMER | en_US |
dc.subject | RETRIEVAL | en_US |
dc.title | Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask | en_US |
dc.type | Article | en_US |
dc.relation.no | 11 | - |
dc.relation.volume | 24 | - |
dc.identifier.doi | 10.1364/OE.24.012055 | - |
dc.relation.page | 2055-2062 | - |
dc.relation.journal | OPTICS EXPRESS | - |
dc.contributor.googleauthor | Woo, Dong Gon | - |
dc.contributor.googleauthor | Lee, Jae Uk | - |
dc.contributor.googleauthor | Hong, Seong Chul | - |
dc.contributor.googleauthor | Kim, Jung Sik | - |
dc.contributor.googleauthor | Ahn, Jinho | - |
dc.relation.code | 2016006239 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | jhahn | - |
dc.identifier.researcherID | C-6442-2015 | - |
dc.identifier.orcid | http://orcid.org/0000-0001-8271-5998 | - |
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