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dc.contributor.author백운규-
dc.date.accessioned2018-04-19T08:43:41Z-
dc.date.available2018-04-19T08:43:41Z-
dc.date.issued2012-03-
dc.identifier.citationJournal of Nanoscience and Nanotechnology, 2012, 12(3), P.2810-2814en_US
dc.identifier.issn1533-4880-
dc.identifier.urihttp://www.ingentaconnect.com/content/asp/jnn/2012/00000012/00000003/art00154;jsessionid=37q4qf67811ql.x-ic-live-01-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/69553-
dc.description.abstractRectangular ceria particles were synthesized using the flash creation method. The influence of the morphology of ceria particles and the surfactant concentration on the removal rate was systematically investigated. These ceria slurries with polymeric surfactant molecules as the passivation agents of Si3N4 film, shows an exceptional non-Prestonian behaviors. The non-Prestonian behavior can be attributed to the increase in the contact area of the ceria particles with the SiO2 film, which is dominated by the morphology of the ceria particles. Force measurements using an atomic force microscope (AFM) at different concentrations of polymeric surfactant molecules was used to identify the interactions between the polymeric molecules and the oxide film and analyze the non-Prestonian behavior of ceria slurry having rectangular abrasives.en_US
dc.description.sponsorshipThis work was financially supported by National Research Foundation on Korea (NRF) through Grant No. K20704000003TA050000310, Global Research Laboratory (GRL) Program provided by the Korean Ministry of Education, Science and Technology (MEST) in 2011, and WCU (World Class University) program through the National Research Foundation of Korea funded by the Ministry of Education, Science and Technology (R31-10092).en_US
dc.language.isoenen_US
dc.publisherAmer Scientific Publishersen_US
dc.subjectCMPen_US
dc.subjectShallow Trench Isolationen_US
dc.subjectOxide Filmen_US
dc.subjectPreston's Lawen_US
dc.subjectCeria Slurryen_US
dc.titleNon-Prestonian Behavior of Rectangular Shaped Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Planarizationen_US
dc.typeArticleen_US
dc.relation.no3-
dc.relation.volume12-
dc.identifier.doi10.1166/jnn.2012.5780-
dc.relation.page2810-2814-
dc.relation.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.contributor.googleauthorKim, Y.-H.-
dc.contributor.googleauthorPaik, U.-
dc.contributor.googleauthorJung, Y.-G.-
dc.contributor.googleauthorYoon, G.S.-
dc.contributor.googleauthorMoon, J.-
dc.contributor.googleauthorWatanabe, A.-
dc.contributor.googleauthorNaito, M.-
dc.relation.code2012214452-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ENERGY ENGINEERING-
dc.identifier.pidupaik-
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COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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