Advanced Flattening Method for Scanned Atomic Force Microscopy Images

Title
Advanced Flattening Method for Scanned Atomic Force Microscopy Images
Author
정정주
Keywords
Atomic force microscopy; Flattening process; Histogram
Issue Date
2012-03
Publisher
Korean Physical SOC
Citation
Journal of the Korean Physical Society, 2013, 60(5), P.L680-L683
Abstract
This paper presents an advanced °attening method to precisely analyze nanostructures by using atomic force microscopy. Distortions caused by the slope of a sample and nonlinearities of the Z scanner can a®ect the height of the scanned image and make the scanned image di±cult to use for quantitative analysis. We propose an advanced °attening method to °atten an image that does not require the user to be experienced. The distortions can be measured and systematically removed from a scanned image. The proposed method is able to substantially reduce both the artifacts caused by °attening and the inspection time using a scanned image.
URI
https://link.springer.com/article/10.3938%2Fjkps.60.680http://repository.hanyang.ac.kr/handle/20.500.11754/69451
ISSN
0374-4884
DOI
10.3938/jkps.60.680
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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