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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-7 of 7 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2005-05
Simulation of thermal resist flow process
오혜근
2008-02
Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness
오혜근
2004-11
Bulk effects of the thermal flow resists
오혜근
2004-11
A study of process parameter control for nanopattern
오혜근
2010-03
Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography
정영대
2003-02
A Practical Method of Extracting the Photoresist Exposure Parameters by Using A Dose-To-Clear Swing Curve
오혜근
2002-04
Modification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the development parameter for a chemically amplified resist simulator
오혜근
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오혜근
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정영대
-Subject
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Lithography
4
Lithography simulation
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CD control
1
Development parameter
1
Dill exposure ABC parameter
1
Dose-to-clear swing curve
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Embedded fluidic channels
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Heat condition
1
Inverse lithography
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Mask error enhancement factor
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