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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED CHEMISTRY(응용화학과)
APPLIED MATHEMATICS(응용수학과)
APPLIED PHYSICS(응용물리학과)
CHEMICAL AND MOLECULAR ENGINEERING(화학분자공학과)
MARINE SCIENCE AND CONVERGENCE ENGINEERING(해양융합공학과)
MARINE SCIENCES AND CONVERGENT TECHNOLOGY(해양융합과학과)
MOLECULAR AND LIFE SCIENCE(분자생명과학과)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
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Results 21-30 of 33 (Search time: 0.004 seconds).
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Issue Date
Title
Author(s)
2010-03
Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography
정영대
2011-01
Advanced Lithography Simulation for Various 3-Dimensional Nano/Microstructuring Fabrications in Positive- and Negative-Tone Photoresists
정영대
2010-12
Simulation Study of Sub-10 nm Pattern Formation Using Diblock Polymer Directed Self-assembly
정영대
2010-05
A study of virtual lithography process for polymer directed self-assembly
정영대
2009-04
Impact of Polarization Inside a Resist for ArF Immersion Lithography
정영대
1999-12
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
오혜근
1999-12
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
오혜근
2003-02
Prediction of the Critical Dimensions by Using a Threshold Energy Resist Model
오혜근
2004-06
The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method
오혜근
2004-06
The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method
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Lithography simulation
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Chemically amplified resist
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CCSE
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Navier-stokes equation
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Pellicle
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2000 - 2009
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