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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 1-6 of 6 (Search time: 0.002 seconds).
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2020-11
Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)
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2021-04
Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition
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2022-03
Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition
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2022-05
The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films
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2020-09
Tuning properties of SnO2/Au/SnO(2)multilayer with variable Au thicknesses as transparent conductive oxides
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2020-02
Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition
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Dielectrics
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Metal organic precursor
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Thin film growth
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