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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 1-8 of 8 (Search time: 0.001 seconds).
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2022-03
Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment
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2022-02
Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC Bias
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2022-01
The effect of an annealing process on atomic layer deposited TiO2 thin films
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2022-03
The effect of an annealing process on atomic layer deposited TiO2 thin films (vol 33, 045705, 2022)
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2022-03
Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition
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2022-05
The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films
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2022-05
Control of Transfer Characteristics of Atomic Layer Deposited Al-Doped SnO2 Thin Film through a Post-Annealing Process
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2022-06
Effect of Hydrogen Plasma Treatment on Atomic Layer Deposited Silicon Nitride Film
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atomic layer deposition
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Atomic layer deposition
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low leakage current
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high dielectric constant
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high-k
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high-k thin film
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low temperature annealing process
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