Power dependence of electron density at various pressures in inductively coupled plasmas
- Title
- Power dependence of electron density at various pressures in inductively coupled plasmas
- Author
- 정진욱
- Keywords
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY DISTRIBUTION; ELECTRON DENSITY; ELECTRONS; PLASMA; PROBABILITY; VARIATIONS
- Issue Date
- 2014-11
- Publisher
- AMERICAN INSTITUTE OF PHYSICS
- Citation
- Physics of Plasmas; 21; 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
- Abstract
- Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn?like distribution.
- URI
- https://aip.scitation.org/doi/abs/10.1063/1.4901305http://hdl.handle.net/20.500.11754/50873
- ISSN
- 1070-664X
- DOI
- 10.1063/1.4901305
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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