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Power dependence of electron density at various pressures in inductively coupled plasmas

Title
Power dependence of electron density at various pressures in inductively coupled plasmas
Author
정진욱
Keywords
70 PLASMA PHYSICS AND FUSION TECHNOLOGY DISTRIBUTION; ELECTRON DENSITY; ELECTRONS; PLASMA; PROBABILITY; VARIATIONS
Issue Date
2014-11
Publisher
AMERICAN INSTITUTE OF PHYSICS
Citation
Physics of Plasmas; 21; 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Abstract
Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn?like distribution.
URI
https://aip.scitation.org/doi/abs/10.1063/1.4901305http://hdl.handle.net/20.500.11754/50873
ISSN
1070-664X
DOI
10.1063/1.4901305
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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