Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Title
- Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Author
- 김영도
- Keywords
- thin films; coating; diffusion; scanning electron microscopy (SEM); hydrogen reduction
- Issue Date
- 2012-09
- Publisher
- Korean Inst Metals and Materials
- Citation
- Journal of Metals and Materials, Sep 2012, 50(9), P.653-657
- Abstract
- In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750 degrees C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 mu m thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al(2)0(3) : NH4Cl = 5 : 92 : 3 (wt%) packs at 900 degrees C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 mu m thickness was observed.
- URI
- http://www.kjmm.or.kr/past/view_kiss.asp?a_key=3083677http://hdl.handle.net/20.500.11754/50031
- ISSN
- 1738-8228
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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