Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 정진욱 | - |
dc.date.accessioned | 2018-03-12T05:41:36Z | - |
dc.date.available | 2018-03-12T05:41:36Z | - |
dc.date.issued | 2013-08 | - |
dc.identifier.citation | PLASMA SOURCES SCIENCE & TECHNOLOGY, OCT 2013, 22(5), P.055005, 8P. | en_US |
dc.identifier.issn | 0963-0252 | - |
dc.identifier.uri | http://iopscience.iop.org/article/10.1088/0963-0252/22/5/055005/meta | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/45383 | - |
dc.description.abstract | In this work, we attempt to overcome the problem of non-uniformity of large-area capacitively coupled plasmas. We select a multi-electrode concept and construct a system with two concentric electrodes. In the two-circuit model, both electrodes have the same area. The plasma of this system is measured by a two-dimensional probe array. We measure the plasma in the large-area chamber that has the multi-electrode. We reduce the non-uniformity to almost 3% and investigate the conditions of a uniform plasma. | en_US |
dc.description.sponsorship | This work was sponsored by the Ministry of Knowledge Economy (MKE) of Korea (Grant Nos 10041681 and 10040428) and the Korea Research Institute of Standards and Science (KRISS). This work was also sponsored by the National R&D Program through the National Research Foundation of Korea (NRF) and the Converging Research Center Program funded by the Korean Government (MSIP) (Grant Nos 2012-0005923, 2012K001235, 2012K001234, 20120009118 and 2010-0029412) | en_US |
dc.language.iso | en | en_US |
dc.publisher | IOP PUBLISHING | en_US |
dc.subject | FREQUENCY CAPACITIVE DISCHARGES | en_US |
dc.subject | STANDING-WAVE | en_US |
dc.subject | DEPOSITION | en_US |
dc.subject | ELECTRODE | en_US |
dc.title | On the plasma uniformity of multi-electrode CCPs for large-area processing | en_US |
dc.type | Article | en_US |
dc.relation.no | 5 | - |
dc.relation.volume | 22 | - |
dc.identifier.doi | 10.1088/0963-0252/22/5/055005 | - |
dc.relation.page | 1-9 | - |
dc.relation.journal | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.contributor.googleauthor | Jung, P.G. | - |
dc.contributor.googleauthor | Hoon, S.S. | - |
dc.contributor.googleauthor | Wook, C.C. | - |
dc.contributor.googleauthor | Young, C.H. | - |
dc.relation.code | 2013011745 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF ELECTRICAL AND BIOMEDICAL ENGINEERING | - |
dc.identifier.pid | joykang | - |
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