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dc.contributor.author박재근-
dc.date.accessioned2018-03-06T08:30:44Z-
dc.date.available2018-03-06T08:30:44Z-
dc.date.issued2012-11-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS, Nov 2012, 51(12), P.4en_US
dc.identifier.issn0021-4922-
dc.identifier.urihttp://iopscience.iop.org/article/10.1143/JJAP.51.120202/meta-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/42982-
dc.description.abstractWe developed a cross-bar nonvolatile hybrid memory cell embedded with Ni nanocrystals in poly(3-hexylthiophene) (P3HT) with cell area of 4F(2), where F is a feature size. The cell demonstrated nonvolatile memory characteristics, such as a memory margin (I-on/I-off ratio) of similar to 5 x 10, over 103 endurance cycles of program-and-erase, and a retention time of 10(4) s at 85 degrees C. In addition, the mechanism of nonvolatile memory operation for the hybrid memory cell was confirmed by the combination of space-charge-limited current and a Fowler-Nordheim tunneling conduction.en_US
dc.description.sponsorshipThis work was supported by a Brain Korea 21 project in 2012 and the Industrial Strategic Technology Development Program funded by the Ministry of Knowledge Economy, Korea.en_US
dc.language.isoenen_US
dc.publisherIOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLANDen_US
dc.subjectELECTRICAL BISTABILITYen_US
dc.subjectSYSTEMen_US
dc.titleNonvolatile Hybrid Memory Cell Embedded with Ni Nanocrystals in Poly(3-hexylthiophene)en_US
dc.typeArticleen_US
dc.relation.no12-
dc.relation.volume51-
dc.identifier.doi10.1143/JJAP.51.120202-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.contributor.googleauthorLee, Jong-Dae-
dc.contributor.googleauthorPark, Jea-Gun-
dc.relation.code2012217131-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidparkjgl-
dc.identifier.researcherID56441837500-
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COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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