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dc.contributor.author강용수-
dc.date.accessioned2018-02-19T01:55:01Z-
dc.date.available2018-02-19T01:55:01Z-
dc.date.issued2012-07-
dc.identifier.citationNANOSCALE; 2012, 4, 7, p2416-p2422en_US
dc.identifier.issn2040-3364-
dc.identifier.urihttp://pubs.rsc.org/en/results?artrefjournalname=NANOSCALE&artrefstartpage=2416&artrefvolumeyear=2012&fcategory=journal-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/38031-
dc.description.abstractHierarchical nanostructured titanium dioxide (TiO2) clumps were fabricated using electrostatic spray with subsequent nitrogen-ion doping by an ion-implantation technique for improvement of energy conversion efficiency for quantum dot-sensitized solar cells (QDSCs). CdSe quantum dots were directly assembled on the produced N-ion-implanted TiO2 photoanodes by chemical bath deposition, and their photovoltaic performance was evaluated in a polysulfide electrolyte with a Pt counter electrode. We found that the photovoltaic performance of TiO2 electrodes was improved by nearly 145% upon N-ion implantation. The efficiency improvement seems to be due to (1) the enhancement of electron transport through the TiO2 layer by inter-particle necking of primary TiO2 particles and (2) an increase in the recombination resistance at TiO2/QD/electrolyte interfaces by healing the surface states or managing the oxygen vacancies upon N-ion doping. Therefore, N-ion-doped photoanodes offer a viable pathway to develop more efficient QD or dye-sensitized solar cells.en_US
dc.description.sponsorshipThis work was supported by the Engineering Research Center Program through a National Research Foundation of Korea (NRF) grant funded by the Ministry of Edu 000005A8 cation, Science and Technology (MEST) (no. 2011-0001055) and also by the World Class University (WCU) program (no. R31-2008-000-10092). We thank Dr. P. Kumar and Dr. D. Kanjilal, Inter-University Accelerator Centre (IUAC), New Delhi, India for providing us with beam time for N-ion implantation. Special thanks to Dr. Jai Prakash, IUAC for his help in Monte Carlo SRIM 2008 simulation.en_US
dc.language.isoenen_US
dc.publisherROYAL SOC CHEMISTRY, THOMAS GRAHAM HOUSE, SCIENCE PARK, MILTON RD, CAMBRIDGE CB4 0WF, CAMBS, ENGLANDen_US
dc.subjectTITANIUM-DIOXIDEen_US
dc.subjectVISIBLE-LIGHTen_US
dc.subjectTHIN-FILMSen_US
dc.subjectDYEen_US
dc.subjectSEMICONDUCTORen_US
dc.subjectELECTROLYTEen_US
dc.subjectSURFACEen_US
dc.subjectNANOMATERIALSen_US
dc.subjectRECOMBINATIONen_US
dc.subjectORIGINen_US
dc.titleN-Ion-implanted TiO2 photoanodes in quantum dot-sensitized solar cellsen_US
dc.typeArticleen_US
dc.relation.no7-
dc.relation.volume4-
dc.identifier.doi10.1039/c2nr11953f-
dc.relation.page2416-2422-
dc.relation.journalNANOSCALE-
dc.contributor.googleauthorSudhagar, P-
dc.contributor.googleauthorAsokan, K-
dc.contributor.googleauthorIto, E-
dc.contributor.googleauthorKang, Yong Soo-
dc.relation.code2012221035-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ENERGY ENGINEERING-
dc.identifier.pidkangys-
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COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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