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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
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2006-11
Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
안일신
2008-11
A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
안일신
2008-08
Ellipsometry for Pellicle-Covered Surface
안일신
2008-08
Ellipsometry for Pellicle-Covered Surface
신동수
2006-11
Investigation of optimum biasing and undercut for single trench alternating phase shift mask in 193 nm lithography
신동수
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안일신
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신동수
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alternating phase shift mask
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bias
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ellipsometry
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haze
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pellicle
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photomask
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pitch
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undercut
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double patterning
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inverse lithography
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