Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김태환 | - |
dc.date.accessioned | 2018-02-06T02:40:59Z | - |
dc.date.available | 2018-02-06T02:40:59Z | - |
dc.date.issued | 2011-02 | - |
dc.identifier.citation | In Journal of Alloys and Compounds 2011 509(5):2176-2179 | en_US |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | http://www.sciencedirect.com/science/article/pii/S0925838810027106?via%3Dihub | - |
dc.description.abstract | Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40nm-CuAlO2/18nm-Ag/40nm-CuAlO2 multilayer films was 2.8×10?5Ωcm, and the transmittance of the multilayer films with an Ag film thickness of 8nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells. | en_US |
dc.description.sponsorship | This work was supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-005-J04102). | en_US |
dc.language.iso | en | en_US |
dc.publisher | Elsevier B.V. | en_US |
dc.subject | Oxide materials | en_US |
dc.subject | Thin films | en_US |
dc.subject | Electronic properties | en_US |
dc.subject | Optical properties | en_US |
dc.subject | Atomic force microscopy | en_US |
dc.subject | AFM | en_US |
dc.subject | X-ray diffraction | en_US |
dc.title | Effect of Ag film thickness on the optical and the electrical properties in CuAlO(2)/Ag/CuAlO(2) multilayer films grown on glass substrates | en_US |
dc.title.alternative | Ag | en_US |
dc.type | Article | en_US |
dc.relation.no | 5 | - |
dc.relation.volume | 509 | - |
dc.identifier.doi | 10.1016/j.jallcom.2010.10.180 | - |
dc.relation.page | 2176-2179 | - |
dc.relation.journal | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.contributor.googleauthor | Oh, Dohyun | - |
dc.contributor.googleauthor | No, Young Soo | - |
dc.contributor.googleauthor | Kim, Su Youn | - |
dc.contributor.googleauthor | Cho, Woon Jo | - |
dc.contributor.googleauthor | Kwack, Kae Dal | - |
dc.contributor.googleauthor | Kim, Tae Whan | - |
dc.relation.code | 2011204617 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DEPARTMENT OF ELECTRONIC ENGINEERING | - |
dc.identifier.pid | twk | - |
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