Rapid thermal annealed Al-doped ZnO film for a UV detector
- Title
- Rapid thermal annealed Al-doped ZnO film for a UV detector
- Author
- 이정호
- Keywords
- Al-doped ZnO (AZO); Rapid thermal annealing; Metal-semiconductor-metal (MSM); Photoelectric application; structure; UV detection
- Issue Date
- 2011-02
- Publisher
- Elsevier BV
- Citation
- Materials Letters, v. 65, NO. 4, Page. 786-789
- Abstract
- A low-resistive Al-doped ZnO (AZO) film was achieved by rapid thermal annealing. A co-sputtering method was used in the initial growth of AZO films and a rapid annealing process was performed on the as-deposited AZO film under N-2 atmosphere for 3 min. An as-deposited AZO film had an optical transmittance of 84.78% at 550 nm and a resistivity of 7.8 x 10(-3) Omega cm. A rapid annealing process significantly improved the optical transmittance and electrical resistivity of the AZO film to 99.67% and 1 x 10(-3) Omega cm, respectively. The structural changes of the AZO films were investigated by X-ray diffraction and transmission electron microscopy. The high quality AZO film was used to fabricate a metal-semiconductor-metal (MSM) structure for a UV detector. The MSM device provided a stable current of 25 mu A at a bias of 2 V in a dark condition. Under UV illumination, the MSM device was highly responsive to UV light uniformly and repeatedly, and it enhanced the current by 80% at 45 mu A. This rapid thermal annealing process may provide a useful method to fabricate quality AZO films for photoelectric applications with a low thermal budget. (C) 2010 Elsevier B.V. All rights reserved.
- URI
- https://www.sciencedirect.com/science/article/pii/S0167577X10010360?via%3Dihubhttps://repository.hanyang.ac.kr/handle/20.500.11754/181391
- ISSN
- 0167-577X;1873-4979
- DOI
- 10.1016/j.matlet.2010.11.065
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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