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dc.contributor.author박진구-
dc.date.accessioned2022-07-29T00:46:45Z-
dc.date.available2022-07-29T00:46:45Z-
dc.date.issued2021-02-
dc.identifier.citationSolid State Phenomena, v. 314, Page. 228-233en_US
dc.identifier.issn1662-9779-
dc.identifier.urihttps://www.scientific.net/SSP.314.228-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/171888-
dc.description.abstractThe adhesion behavior of thermally aged particles was studied by characterizing the footprint, which could be formed between a particle and a substrate. To understand the formation mechanism of the footprint, the effects of temperature and aging time on the particle removal were studied. Understanding the particle adhesion and removal aged at high temperatures is important to maintain the cleanness of the wafer backside where many contaminants could adhere on in various wafer process chambers.en_US
dc.language.isoenen_US
dc.publisherScientific.neten_US
dc.subjectParticle Defecten_US
dc.subjectWafer backsideen_US
dc.subjectFootprinten_US
dc.subjectThermal agingen_US
dc.subjectCleaningen_US
dc.titleThe Effect of Thermal Aging on Nano-Particle Removalen_US
dc.typeArticleen_US
dc.relation.volume314-
dc.identifier.doi10.4028/www.scientific.net/SSP.314.228-
dc.relation.page228-233-
dc.relation.journalSolid State Phenomena-
dc.contributor.googleauthorKim, Yeoho-
dc.contributor.googleauthorJin, Seung Wan-
dc.contributor.googleauthorKim, Hyun-Tae-
dc.contributor.googleauthorKim, Tae-Gon-
dc.contributor.googleauthorWon, Kyu-Hwang-
dc.contributor.googleauthorPark, Jin-Goo-
dc.relation.code2021035264-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING-
dc.identifier.pidjgpark-
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COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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