Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진구 | - |
dc.date.accessioned | 2021-04-15T05:10:54Z | - |
dc.date.available | 2021-04-15T05:10:54Z | - |
dc.date.issued | 2001-11 | - |
dc.identifier.citation | 한국마이크로전자및패키징학회 학술대회논문집 2001, page. 235-239 | en_US |
dc.identifier.uri | koreascience.kr/article/CFKO200111921015014.page | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/161426 | - |
dc.description.abstract | In recent years, as Chemical Mechanical Planarization(CMP) has been routinely utilized in integrated circuit(IC) fabrication, the consumption of slurry, main consumable in a CMP process, is greatly increased. Thus the reprocess of CMP slurries has been actively considered in the industry to reduce cost-of-consumable (COC). The main purpose of this study was to recycle the used oxide slurry using filters as a new method. As a result, Ultra Fine(UF) Filter could distinguish silica from the used oxide slurry and Reverse Osmosis(RO) Filter could distinguish Deionized(DI) Water and chemistry from chemistry solution. The tetraethylorthosilicate removal rate was almost the same as the number of recycle polishing was increased, when it was modified by slightly adding new SS-12 slurry. The microscratch didnt found as the number of recycle polishing was increased. | en_US |
dc.language.iso | en | en_US |
dc.publisher | 한국마이크로전자및패키징학회 | en_US |
dc.title | Physical and Chemical Characterization of Recycled Oxide CMP Slurry | en_US |
dc.title.alternative | 재생된 옥사이드 CMP 슬러리의 물리적, 화학적 특징에 대한 연구 | en_US |
dc.type | Article | en_US |
dc.relation.journal | 마이크로전자 및 패키징학회지 | - |
dc.contributor.googleauthor | 김명식 | - |
dc.contributor.googleauthor | 이관호 | - |
dc.contributor.googleauthor | 박진구 | - |
dc.relation.code | 2012100509 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF ENGINEERING SCIENCES[E] | - |
dc.sector.department | DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING | - |
dc.identifier.pid | jgpark | - |
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