Microwave performance of recessed gate A10.2 Ga0.8 N/GaN HFETs fabricated using a photoelectrochemical etching technique
- Title
- Microwave performance of recessed gate A10.2 Ga0.8 N/GaN HFETs fabricated using a photoelectrochemical etching technique
- Author
- 오재응
- Keywords
- GaN; HFET; Photoelectrochemical etching; Maximum frequency
- Issue Date
- 2002-04
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology, v. 95, issue. 1, page. 73-76
- Abstract
- This is the first report on the fabrication of AlGaN/GaN HFETs which has a recessed gate structure achieved by the photoelectrochemical etching technique. Optimal photoelectrochemical wet etching conditions were stabilized and applied for the device fabrication. The DC and large-signal RF performance of thus fabricated device is presented as well. The ohmic contacts fabricated on the n(+)-GaN layer exhibited contact resistivity of mid 10(-6) Omega cm(2) and resulted in a linear I-V characteristics during an operation of device. The maximum drain-source current density is approximately 174 mA mm(-1) (at V-GS = 1 V), and the transconductance of approximately 68 mS mm(-1) (at V-GS = -1.1 V, V-DS = 6 V). The maximum frequency is measured to be approximately 31 GHz, and an RF power of 84 mW mm(-1) at 1.8 GHz for a 1400-mum wide gate device. (C) 2002 Elsevier Science B.V. All rights reserved.
- URI
- https://www.sciencedirect.com/science/article/pii/S0921510702001654?via%3Dihubhttps://repository.hanyang.ac.kr/handle/20.500.11754/157251
- ISSN
- 0921-5107
- DOI
- 10.1016/S0921-5107(02)00165-4
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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