Mueller matrix ellipsometry 제작 및 응용
- Title
- Mueller matrix ellipsometry 제작 및 응용
- Other Titles
- Development and Application of Mueller Matrix Ellipsometry
- Author
- 안일신
- Keywords
- #Mueller Matri; Ellipsometry; Anisotropic; Dual Rotating Compensator Ellipsometry
- Issue Date
- 2003-12
- Publisher
- 한국반도체장비학회
- Citation
- 한국반도체및디스플레이장비학회 2003년도 추계학술대회 발표 논문집, page. 12-17
- Abstract
- We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al[1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of Tc=10 s. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilized data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.
- URI
- https://www.dbpia.co.kr/Journal/articleDetail?nodeId=NODE09428699https://repository.hanyang.ac.kr/handle/20.500.11754/156680
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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