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dc.contributor.author김희택-
dc.date.accessioned2020-12-11T04:52:15Z-
dc.date.available2020-12-11T04:52:15Z-
dc.date.issued2003-08-
dc.identifier.citationCOLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, v.224, issue. 1-3, page. 119-126en_US
dc.identifier.issn0927-7757-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0927775703002528-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/156138-
dc.description.abstractMonodispersed, spherical titania (TiO2)-coated silica (SiO2) fine particles were synthesized by semi-batch process. By this process, SiO2 fine particles were also prepared and were used as carrier particles for the coating. The mean size of SiO2 particles was 250 nm. The reaction parameters were the concentration of tetraethylorthotitanate (TEOT), the amount of hydroxypropylcellulose (HPC) as a dispersant, the feed rate of starting solution (TEOT + HPC + EtOH) and reaction temperature. As a result, the following results were obtained; particle size of titania-coated silica particles decreased with a decreasing TEOT concentration, slow feed rate and increasing amount of HPC. In addition, it was desirable to maintain a reaction temperature at 15-18 degreesC in order to obtain the monodispersed fine particles. Consequently, the optimal conditions for the preparation of titania-coated silica particles with narrow size distribution were TEOT (0.03-0.04 M), HPC (0.001-0.0013 g ml(-1)), feed rate (0.5-0.6 ml min(-1)), and reaction temperature (15-18 degreesC). The samples were characterized using FT-IR, EDS, TEM and BET analyzer. The coating thickness of TiO2 particles obtained by using the above conditions was about 5-10 nm. (C) 2003 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.publisherELSEVIER SCIENCE BVen_US
dc.subjectTitania (TiO2)-coated silica (SiO2)en_US
dc.subjectSemi-batch processen_US
dc.subjectHPCen_US
dc.subjectOptimal conditionsen_US
dc.titleSynthesis and characterization of titania-coated silica fine particles in semi-batch processen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0927-7757(03)00252-8-
dc.relation.journalCOLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS-
dc.contributor.googleauthorKim, Ki Do-
dc.contributor.googleauthorBae, Hyun Joo-
dc.contributor.googleauthorKim, Hee Taik-
dc.relation.code2009202091-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING-
dc.identifier.pidkhtaik-
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COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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