Repository at Hanyang UniversityCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)PHOTONICS AND NANOELECTRONICS(나노광전자학과)Articles
208
0
A Practical Method of Extracting the Photoresist Exposure Parameters by Using a Dose-to-Clear Swing Curve
- Title
- A Practical Method of Extracting the Photoresist Exposure Parameters by Using a Dose-to-Clear Swing Curve
- Author
- 안일신
- Keywords
- Dill exposure ABC parameter; Photolithography simulation; Chemically amplified resist; Dose-to-clear swing curve
- Issue Date
- 2003-02
- Publisher
- KOREAN PHYSICAL SOC(한국물리학회)
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, No.3, Page.280-284
- URI
- https://www.kci.go.kr/kciportal/ci/sereArticleSearch/ciSereArtiView.kci?sereArticleSearchBean.artiId=ART001196551https://repository.hanyang.ac.kr/handle/20.500.11754/154898
- ISSN
- 0374-4884
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
- Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
