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dc.contributor.author안일신-
dc.date.accessioned2020-04-22T07:46:32Z-
dc.date.available2020-04-22T07:46:32Z-
dc.date.issued2004-07-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS, v.43, No. 8B, Page. L1078-L1080en_US
dc.identifier.issn1347-4065-
dc.identifier.urihttps://iopscience.iop.org/article/10.1143/JJAP.43.L1078/meta-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/151196-
dc.description.abstractWe report a novel etching technique for gold film based on a new phenomenon that gold is soluble in chlorine-containing solutions or solvents under UV irradiation. This is a promising method for gold patterning possibly in microdevice or nanodevice fabrication. Mask patterns can be transferred to a gold surface directly without resorting to a complex photoresist process, and etch rate can be controlled from sub-nanometer to a few tens of nanometers per minute by adjusting exposure parameters. Moreover, nontoxic liquid such as NaCl solution can be used for the process.en_US
dc.description.sponsorshipThis work was supported by Grant No. (R11-2002-099) from Quantum Photonics Science Research Center at Hanyang University. The authors also wish to acknowledge the financial support from Hanyang University provided in 2001.en_US
dc.language.isoen_USen_US
dc.publisherINST PURE APPLIED PHYSICSen_US
dc.subjectgolden_US
dc.subjectetchen_US
dc.subjectUVen_US
dc.subjectchlorineen_US
dc.subjectpatterninen_US
dc.titlePhotoinduced patterning of gold thin filmen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.43.L1078-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS-
dc.contributor.googleauthorAn, Ilsin-
dc.contributor.googleauthorSeong, Deokkyeon-
dc.contributor.googleauthorOh, Hyekeun-
dc.relation.code2012204501-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]-
dc.sector.departmentDEPARTMENT OF PHOTONICS AND NANOELECTRONICS-
dc.identifier.pidilsin-


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