Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 백운규, 김효태 | - |
dc.contributor.author | 임종우 | - |
dc.date.accessioned | 2020-04-07T17:12:27Z | - |
dc.date.available | 2020-04-07T17:12:27Z | - |
dc.date.issued | 2008-02 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/147575 | - |
dc.identifier.uri | http://hanyang.dcollection.net/common/orgView/200000408179 | en_US |
dc.description.abstract | Thick film lithography applied photo-lithography in thin film process to conventional thick film process including screen-printing. This technology enables patterns to form finer resolution while compared to the conventional thick film process and a similar level of packaging density can be achieved when compared to thin film or etched thick film circuits. Because of the better edge definition than that of screen-printed patterns, thick film lithography draw a significant attention in the RF/Microwave and integrated LTCC module. In this research, low temperature cofireable ceramic so called LTCC dielectric and conductor pastes, which enabled the formation of thick film fine-via and line using photo-lithographic technology, were developed. The optimum composition for fine patterns was studied by varying the amounts of solid material powder, polymer-monomer ratio, and amount of photoinitiator. The effect of processing parameter such as UV-exposing dose on the formation of fine pattern was also tested. And formation of fine pattern was tested on LTCC green sheet after testing on soda-lime glass wafer as a substrate. The developed photoimageable pastes were printed on substrate, then dried, and exposed to UV-radiation. The formation of fine pattern was tested for multilayer with stacked layer of pastes. Fine pattern formed was a excellent, when buffer layer was coated on LTCC green sheet. As a result, it was found that the ratio of polymer to monomer, solid material loading and the amount of photo-initiator were the main factors affecting the resolution of fine pattern. | - |
dc.publisher | 한양대학교 | - |
dc.title | 감광성 페이스트 및 후막리소그라피에 의한 미세패터닝 기술 | - |
dc.title.alternative | Micro-patterning by Thick Film Lithography Using Photoimageable Paste | - |
dc.type | Theses | - |
dc.contributor.googleauthor | 임종우 | - |
dc.contributor.alternativeauthor | Lim, Jong Woo | - |
dc.sector.campus | S | - |
dc.sector.daehak | 대학원 | - |
dc.sector.department | 신소재공학과 | - |
dc.description.degree | Master | - |
dc.contributor.affiliation | 감광성 페이스트를 이용한 미세 패터닝 | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.