Control of tungsten protrusion with surface active agent during tungsten chemical mechanical polishing
- Title
- Control of tungsten protrusion with surface active agent during tungsten chemical mechanical polishing
- Author
- 송태섭
- Keywords
- SILICA NANOPARTICLES; CMP; SLURRY; PLANARIZATION; OPTIMIZATION; DEFECTS; ACID; SIZE
- Issue Date
- 2017-11
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v. 6, no. 12, page. P822-P827
- Abstract
- With shrinkage of the minimum feature size to sub-14 nm, protrusion/dishing issues in chemical mechanical planarization (CMP) processes have become increasingly important to address. In this study, we propose an advanced slurry formulation with a surface active agent to prevent W protrusion during the W CMP process. In the presence of surface active agent, blanket removal rates on both W and SiO2 films showed non-Prestonian behavior at a low threshold pressure, which is explained by adsorption characteristics of the surface active agent on the films. To study the effect of the surface active agent on W protrusion, W-patterned wafers were polished at the threshold pressure. As the concentration of the surface active agent increased from 0 to 12 mM, W protrusion from patterns with line/space widths of 0.5 mu m/0.5 mu m decreased significantly from 186 to 30 A. The mechanism on the significant decrease in W protrusion behavior in the presence of the surface active agent is discussed. (c) 2017 The Electrochemical Society. All rights reserved.
- URI
- http://jss.ecsdl.org/content/6/12/P822https://repository.hanyang.ac.kr/handle/20.500.11754/116107
- ISSN
- 2162-8769
- DOI
- 10.1149/2.0151712jss
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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