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dc.contributor.author윤태현-
dc.date.accessioned2019-11-24T17:25:43Z-
dc.date.available2019-11-24T17:25:43Z-
dc.date.issued2017-04-
dc.identifier.citationJOURNAL OF MICROMECHANICS AND MICROENGINEERING, v. 27, no. 5, Article no. 055009en_US
dc.identifier.issn0960-1317-
dc.identifier.issn1361-6439-
dc.identifier.urihttps://iopscience.iop.org/article/10.1088/1361-6439/aa6672-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/113770-
dc.description.abstractA pinched flow fractionation device with trapezoid-shaped pinched segment and cross-flow side channels (t-PFF-v) was redesigned and fabricated with a one-stop anisotropic chemical wet etching process and its enhanced separation capability was demonstrated for spherical polystyrene (PS) particles with diameter ranges of 2-8 mu m. The tilted sidewalls and vertical focusing channels of the t-PFF-v device led to an improved separation resolution (R-m,(n)) via enhanced separation distance of PS particles at the pinched segment (Delta x(m, n)) and reduced effluent particle distribution width (s(n)). Using this t-PFF-v device with W-p (pinched segment width) of 25 mu m, PS particles with diameters of 4, 6, and 8 mu m were simultaneously separated with good separation resolution (R-4,R-6 = 3.2 and R-6,R-8 = 3.4). Moreover, by adapting even smaller pinched segment width (Wp = 15 mu m), PS particles with diameters of 2 and 4 mu m, not well separated in the previous studies, were clearly separated with 9.5-fold improvement in R-2,R-4 compared with the normal PFF device (n-PFF). The effects of inlet flow rate ratio (Q(2)/Q(1)) on the separation efficiency were also carefully investigated and provided additional insight on the separation processes within the pinched segment of t-PFF-v device. The drain flow through the cross-flow v-channels helps better alignment of particles at the sidewall of pinched segment and resulted in significantly reduced distribution of effluent particles, even under the operating conditions with low Q(2)/Q(1) values.en_US
dc.description.sponsorshipWe would like to acknowledge experimental support from Nuri Yang (Hanyang University). H W Nho and T H Yoon appreciate partial support from the Industrial Strategic Technology Development Program, (Grant No. 10043929) funded by the Ministry of Trade, Industry and Energy (MOTIE, Republic of Korea). H W Nho and J S Park also appreciate partial support from the R& D Convergence Program of MSIP (Ministry of Science, ICT and Future Planning) and the NST (National Research Council of Science and Technology) of the Republic of Korea (Grant CAP-13-1-KITECH).en_US
dc.language.isoen_USen_US
dc.publisherIOP PUBLISHING LTDen_US
dc.subjectmicrofluidicsen_US
dc.subjectseparationen_US
dc.subjectpinched flow fractionationen_US
dc.subjectanisotropic Si chemical etchingen_US
dc.titleRedesigned t-PFF-v device fabricated with one-step anisotropic chemical wet etching process: enhanced separation efficiency for colloidal particles in continuous-modeen_US
dc.typeArticleen_US
dc.relation.volume27-
dc.identifier.doi10.1088/1361-6439/aa6672-
dc.relation.page55009-55017-
dc.relation.journalJOURNAL OF MICROMECHANICS AND MICROENGINEERING-
dc.contributor.googleauthorNho, Hyun Woo-
dc.contributor.googleauthorPark, Joon Shik-
dc.contributor.googleauthorYoon, Tae Hyun-
dc.relation.code2017000542-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF NATURAL SCIENCES[S]-
dc.sector.departmentDEPARTMENT OF CHEMISTRY-
dc.identifier.pidtaeyoon-
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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