Repository at Hanyang UniversityCOLLEGE OF ENGINEERING[S](공과대학)MECHANICAL ENGINEERING(기계공학부)Articles
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김학성 | - |
| dc.date.accessioned | 2019-10-02T02:00:00Z | - |
| dc.date.available | 2019-10-02T02:00:00Z | - |
| dc.date.issued | 2019-04 | - |
| dc.identifier.citation | 대한기계학회 재료 및 파괴부문 2019년도 춘계학술대회 논문집, Page. 43-44 | en_US |
| dc.identifier.uri | http://www.dbpia.co.kr/view/ar_view.asp?arid=4803427 | - |
| dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/110804 | - |
| dc.description.sponsorship | This work was supported by National Research Foundation of Korea(NRF) funded by the Ministry of Education(2012R1A6A1029029 and 2018R1D1A1A09083236). This work was also supported by the Materials&Components Technology Development Program (20002957,Development of AgNW RGO transparent electrode material and process based on IPL for OPV) funded by the Ministry of Trade,Industry & Energy(MOTIE,Korea). | en_US |
| dc.language.iso | ko_KR | en_US |
| dc.publisher | 대한기계학회 | en_US |
| dc.title | IGZO 반도체 및 구리 전극의 deep-UV/IPL 광어닐링 공정을 통한 TFT 특성 연구 | en_US |
| dc.title.alternative | Study on all intense pulsed light (IPL) annealed thin film transistor (TFT) using IGZO semiconductor and Cu source drain via UV-assisted flash light irradiation | en_US |
| dc.type | Article | en_US |
| dc.relation.page | 1-1 | - |
| dc.contributor.googleauthor | 장용래 | - |
| dc.contributor.googleauthor | 문창진 | - |
| dc.contributor.googleauthor | 박종휘 | - |
| dc.contributor.googleauthor | 김학성 | - |
| dc.contributor.googleauthor | Jang, Yong-Rae | - |
| dc.contributor.googleauthor | Moon, Chang-Jin | - |
| dc.contributor.googleauthor | Park, Jong-Whi | - |
| dc.contributor.googleauthor | Kim, Hak-Sung | - |
| dc.sector.campus | S | - |
| dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
| dc.sector.department | DIVISION OF MECHANICAL ENGINEERING | - |
| dc.identifier.pid | kima | - |
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