A Modeling Approach of Spatially Distributed Defects in a Semiconductor Manufacturing
- Title
- A Modeling Approach of Spatially Distributed Defects in a Semiconductor Manufacturing
- Author
- 강창욱
- Keywords
- Integrated Circuits (ICs); Spatial clustering; Zero-inflated Poisson (ZIP) regression; Yield
- Issue Date
- 2005-05
- Publisher
- 한국산업경영시스템학회
- Citation
- 한국산업경영시스템학회 2005 춘계학술대회 논문집, Page. 111-115
- Abstract
- The need for accurate yield prediction is increasing for estimating productivity and production costs to secure high revenues in the semiconductor industry. Corresponding to this end, we introduce new spatial modeling approaches for spatially clustered defects on an integrated circuit (IC) wafer map. We use spatial location of an IC chip on the wafer as a covariate on corresponding defects count listed in a wafer map. Analysis results indicate that yield prediction can be greatly improved by capturing spatial features of defects. Tyagi and Bayoumi's (1994) wafer map data are used to illustrate the procedure.
- URI
- http://db.koreascholar.com/Article?code=354128https://repository.hanyang.ac.kr/handle/20.500.11754/110668
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > INDUSTRIAL AND MANAGEMENT ENGINEERING(산업경영공학과) > Articles
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