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dc.contributor.author오제훈-
dc.date.accessioned2019-04-29T00:05:02Z-
dc.date.available2019-04-29T00:05:02Z-
dc.date.issued2016-10-
dc.identifier.citation한국정밀공학회 2016년도 추계학술대회 논문집, Page. 96-97en_US
dc.identifier.urihttp://www.dbpia.co.kr/Journal/ArticleDetail/NODE07065754-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/102785-
dc.description.sponsorship본 연구는 중소기업청의 World Class 300 R&D 사업의 일환으로 수행하였음. (과제번호: S2341147, 1m 길이를 갖는 laser line beam 을 이 용한 5 μm 급 고해상도 스캔 얼라이너 개발)en_US
dc.language.isoko_KRen_US
dc.publisher한국정밀공학회en_US
dc.subjectMask stageen_US
dc.subjectProximity exposureen_US
dc.subjectGap controlen_US
dc.subjectMask holderen_US
dc.title대면적 비접촉식 노광장비 마스크와 기판의 국부적 간극제어를 위한 설계en_US
dc.title.alternativeDesign of The Local Gap Control between Mask and Substrate for Large Areas Noncontact Exposure Systemen_US
dc.typeArticleen_US
dc.relation.page1-2-
dc.contributor.googleauthor이다연-
dc.contributor.googleauthor오제훈-
dc.contributor.googleauthor이재웅-
dc.contributor.googleauthor류상길-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MECHANICAL ENGINEERING-
dc.identifier.pidjehoon-
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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