294 0

Full metadata record

DC FieldValueLanguage
dc.contributor.advisor박진성-
dc.contributor.authorSu-Ho Lim-
dc.date.accessioned2019-02-28T03:01:31Z-
dc.date.available2019-02-28T03:01:31Z-
dc.date.issued2019-02-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/99380-
dc.identifier.urihttp://hanyang.dcollection.net/common/orgView/200000434654en_US
dc.description.abstractThin film encapsulation (TFE) using a multilayer film composed of SiOx and SiNxOyCz layers deposited by plasma-enhanced atomic layer deposition is demonstrated. To investigate the mechanism of suppressed moisture penetration for the multilayer film, chemical analyses were performed using Fourier transform infrared and Auger electron spectroscopy, and the encapsulation ability was evaluated using the water vapor transmission rate (WVTR). The encapsulation ability of the multilayer film is affected by the nitrogen content in the SiNxOyCz layer and the number of interfaces in the multilayer film. Consequently, TFE using a multilayer film of 20-nm-SiNxOyCz/ 20-nm-SiOx/ 20-nm-SiNxOyCz resulted in excellent encapsulation ability, with a WVTR of 7.63 x 10-4 g m-2 day-1.-
dc.publisher한양대학교-
dc.titleOptimization of a SiOx / SiNxOyCz multilayer structure for a reliable gas diffusion-
dc.title.alternative저온 플라즈마 ALD를 통한 신뢰성 있는 SiOx / SiNxOyCz Encapsulation 다층 구조의 최적화-
dc.typeTheses-
dc.contributor.googleauthor임수호-
dc.contributor.alternativeauthor임수호-
dc.sector.campusS-
dc.sector.daehak대학원-
dc.sector.department신소재공학과-
dc.description.degreeMaster-
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > MATERIALS SCIENCE & ENGINEERING(신소재공학과) > Theses (Master)
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE