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Optimization of a SiOx / SiNxOyCz multilayer structure for a reliable gas diffusion

Title
Optimization of a SiOx / SiNxOyCz multilayer structure for a reliable gas diffusion
Other Titles
저온 플라즈마 ALD를 통한 신뢰성 있는 SiOx / SiNxOyCz Encapsulation 다층 구조의 최적화
Author
Su-Ho Lim
Alternative Author(s)
임수호
Advisor(s)
박진성
Issue Date
2019-02
Publisher
한양대학교
Degree
Master
Abstract
Thin film encapsulation (TFE) using a multilayer film composed of SiOx and SiNxOyCz layers deposited by plasma-enhanced atomic layer deposition is demonstrated. To investigate the mechanism of suppressed moisture penetration for the multilayer film, chemical analyses were performed using Fourier transform infrared and Auger electron spectroscopy, and the encapsulation ability was evaluated using the water vapor transmission rate (WVTR). The encapsulation ability of the multilayer film is affected by the nitrogen content in the SiNxOyCz layer and the number of interfaces in the multilayer film. Consequently, TFE using a multilayer film of 20-nm-SiNxOyCz/ 20-nm-SiOx/ 20-nm-SiNxOyCz resulted in excellent encapsulation ability, with a WVTR of 7.63 x 10-4 g m-2 day-1.
URI
https://repository.hanyang.ac.kr/handle/20.500.11754/99380http://hanyang.dcollection.net/common/orgView/200000434654
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > MATERIALS SCIENCE & ENGINEERING(신소재공학과) > Theses (Master)
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