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Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition

Title
Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition
Author
이선영
Keywords
PULSED-LASER DEPOSITION; DLC FILMS; TRIBOLOGICAL PROPERTIES; ELECTRICAL-PROPERTIES; MECHANICAL-PROPERTIES; AMORPHOUS-CARBON; ATOMIC-STRUCTURE; BIAS VOLTAGE; THIN-FILMS; EVAPORATION
Issue Date
2017-02
Publisher
IOP PUBLISHING LTD
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v. 56, No. 3, Article no. 035506
Abstract
Diamond-like carbon films containing titanium and hydrogen (Ti-doped DLC: H) were synthesized using a hybrid technique based on physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD). The film was deposited under a mixture of argon (Ar) and acetylene gas (C2H2). The amount of Ti in the Ti-doped DLC: H film was controlled by varying the DC power of the Ti sputtering target ranging from 0 to 240W. The composition, microstructure, mechanical and chemical properties of Ti-doped DLC: H films with varying Ti concentrations, were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nano indentation, a ball-on-disk tribometer, a four-point probe system and dynamic anodic testing. As a result, the optimum composition of Ti in Ti-doped DLC: H film using our hybrid method was found to be a Ti content of 18 at. %, having superior electrical conductivity and high corrosion resistance, suitable for bipolar plates. Its hardness value was measured to be 25.6GPa with a low friction factor. (C) 2017 The Japan Society of Applied Physics
URI
http://iopscience.iop.org/article/10.7567/JJAP.56.035506/metahttps://repository.hanyang.ac.kr/handle/20.500.11754/71696
ISSN
0021-4922; 1347-4065
DOI
10.7567/JJAP.56.035506
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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