Repository at Hanyang UniversityCOLLEGE OF ENGINEERING[S](공과대학)ELECTRONIC ENGINEERING(융합전자공학부)Articles
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Fast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure
- Title
- Fast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure
- Author
- 유창재
- Keywords
- Active pixel; Alignment layers; Deformation energy; Double-step; Fast response time; Patterned vertical alignment; Reactive mesogen; Ultraviolet exposure
- Issue Date
- 2012-12
- Publisher
- Department of Electronics and Computer Engineering
- Citation
- In: Proceedings of the International Display Workshops, Society for Information Display - 19th International Display Workshops 2012, IDW/AD 2012. (Proceedings of the International Display Workshops, 2012, 1:123-125)
- Abstract
- We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one.
- URI
- https://pdfs.semanticscholar.org/5ff8/5e3a60c4ce1376cf1c52df7bd7e59eedcf11.pdfhttps://repository.hanyang.ac.kr/handle/20.500.11754/70656
- ISBN
- 9781627486521
- ISSN
- 1883-2490
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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