원자층 및 분자층 증착법을 이용한 유기-무기 복합층 제작과 가스 확산 방지막에의 응용

Abstract

Gas-difusion barriers plays key role in many applications today to improve lifetime of devices. In particular, organic optoelectronic devices such as organic light-emitting diodes(OLED) and organic solar cells(OSCs) grown on plastic substrate require high efficient encapsulation layer because many organic or electrode materials are sensitive to oxygen and moisture, which has well known to cause device degradation and limited lifetime. In this paper, we deposited highly uniform and thin organic-inorganic hybrid films at low temperature (below 120℃) and bifunctional organic molecules and metal alkyls by ALD/MLD method on PET substrate(Dupont, ST 504) and glass. 4-mercaptobenzyl alcohol(4MBA) is used as organic precursor, trimethyl aluminum(TMA) is used as inorganic precursor. Barrier property of hybrid thin film were studied by Water vapor transmition rates(WVTR). WVTR test were done by 144 Ca dot arrays acceleration test(relative humidity condition 70℃, 70%). WVTR values of hybrid thin film below 10-6g/m2day in room condition. Al2O3/Al-4MBA hybrid thin films exhibit high flexibility on 1:8 ratio. WVTR values are around 10-6g/m2day even the films were bent 100 with bending radius 0.5cm(5R). Organic-inorganic hybrid Al2O3/Al-4MBA films could be used as gas-diffusion barrier for thin-film OLED and many flexible electric applications.