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Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

Title
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Author
이효창
Keywords
Biased inductively coupled plasma; RF bias power; Plasma density; Electron energy distribution; Plasma uniformity; Electron heating
Issue Date
2011-01
Publisher
Elsevier Science B.V., Amsterdam.
Citation
THIN SOLID FILMS 권: 519 호: 20 페이지: 7009-7013
Abstract
Changes in the plasma non-uniformity and the electron energy distribution function (EEDF) by increasing RF bias power were observed in inductively coupled plasma using spatially resolved radial EEDF measurements. As the bias power was increased at a fixed ICP power at a low gas pressure, The EEDF was evolved from a bi-Maxwellian to a Maxwellian distribution. The plasma density was decreased in all radial positions and thus plasma non-uniformity was slightly changed. However, strongly improved plasma spatial non-uniformity was observed at a high gas pressure with a decrease in the center-plasma density and an increase in the radial edge-plasma density. This result could be understood by combined effects of the ion acceleration loss and the non-uniform power deposition due to the RF bias power. (C) 2011 Published by Elsevier B.V.
URI
https://www.sciencedirect.com/science/article/pii/S004060901100277X?via%3Dihubhttp://hdl.handle.net/20.500.11754/66177
ISSN
0040-6090
DOI
10.1016/j.tsf.2011.01.218
Appears in Collections:
RESEARCH INSTITUTE[S](부설연구소) > ETC
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