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dc.contributor.author남창우-
dc.date.accessioned2018-04-13T05:15:23Z-
dc.date.available2018-04-13T05:15:23Z-
dc.date.issued2016-05-
dc.identifier.citationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 68, NO 10, Page. 1215-1220en_US
dc.identifier.issn0374-4884-
dc.identifier.issn1976-8524-
dc.identifier.urihttps://link.springer.com/article/10.3938%2Fjkps.68.1215-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/65838-
dc.description.abstractHigh-temperature oxidation of iron thin films deposited on Pt(100) surfaces was studied by using X-ray photoelectron spectroscopy (XPS). Upon an oxygen exposure of 300 Langmuir onto a 7.5- monolayer (ML) Fe film at 830 K, about 2 monolayers of the Fe film were oxidized as Fe3O4 while the remaining Fe atoms diffused into the substrate. For 1.25-, 2.5-, and 3.75-monolayer Fe films, only about a monolayer of the Fe film was oxidized as FeO, regardless of the number of Fe atoms. The oxide layers on the 7.5-monolayer Fe film were observed to be stable upon post-annealing at 1030 K.en_US
dc.language.isoenen_US
dc.publisherKOREAN PHYSICAL SOCen_US
dc.subjectIron oxideen_US
dc.subjectIronen_US
dc.subjectPlatinumen_US
dc.subjectOxidationen_US
dc.subjectX-ray photoelectron spectroscopyen_US
dc.titleStudy of high-temperature oxidation of ultrathin fe films on Pt(100) by using X-ray photoelectron spectroscopyen_US
dc.typeArticleen_US
dc.relation.no10-
dc.relation.volume68-
dc.identifier.doi10.3938/jkps.68.1215-
dc.relation.page1215-1220-
dc.relation.journalJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.contributor.googleauthorNahm, T-U.-
dc.relation.code2016000430-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF NATURAL SCIENCES[S]-
dc.sector.departmentDEPARTMENT OF PHYSICS-
dc.identifier.pidtschnahm-
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COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > PHYSICS(물리학과) > Articles
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