| 2011-02 | Generation of Pad Debris during Oxide CMP Process and Its Role in Scratch Formation | 박진구 |
| 2013-05 | Hybrid Cleaning Technology for Enhanced Post-Cu/Low-Dielectric Constant Chemical Mechanical Planarization Cleaning Performance | 박진구 |
| 2011-07 | Hydrophobic Modification of Diamond Conditioner for Prevention of Particle Adhesion During Oxide CMP | 박진구 |
| 2017-03 | Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography | 박진구 |
| 2015-03 | Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography | 박진구 |
| 2017-10 | Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle | 박진구 |
| 2012-07 | Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing | 박진구 |
| 2016-09 | Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning | 박진구 |
| 2016-05 | Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process | 박진구 |
| 2015-02 | Investigation of oxide layer removal mechanism using reactive gases | 박진구 |
| 2013-05 | Investigation of Source-Based Scratch Formation During Oxide Chemical Mechanical Planarization | 박진구 |
| 2015-02 | Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates | 박진구 |
| 2015-04 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 박진구 |
| 2013-04 | Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP | 박진구 |
| 2015-03 | Multi-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reduction | 박진구 |
| 2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 박진구 |
| 2011-10 | Nano Gas Cluster Dry Cleaning for Damage Free Particle Removal | 박진구 |
| 2012-07 | Nanoscale Particle Removal Using Wet Laser Shockwave Cleaning | 박진구 |
| 2013-01 | Non Destructive Nanoparticle Removal from Submicron Structures Using Megasonic Cleaning | 박진구 |
| 2015-01 | Novel one-step route to induce long-term lotus leaf-like hydrophobicity in polyester fabric | 박진구 |
| 2013-04 | On the mechanism of material removal by fixed abrasive lapping of various glass substrates | 박진구 |
| 2013-04 | Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers | 박진구 |
| 2017-01 | Preparation of a high hydrophobic aluminium surface by double zincating process | 박진구 |
| 2015-10 | Prevention of Metal Contamination in Sub 50 nm SC1 Cleaning Process | 박진구 |
| 2013-08 | Quantitative Analysis of H5N1 DNA Hybridization on Nanowell Array Electrode | 박진구 |
| 2011-04 | Random yield loss during wafer cleaning | 박진구 |
| 2018-10 | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | 박진구 |
| 2015-08 | Removal of Nano-sized Particles Using Carbon Dioxide (CO2) Gas Cluster Cleaning without Pattern Damage | 박진구 |
| 2013-01 | Removal of UV cured resin using hybrid cleaning method | 박진구 |
| 2014-01 | Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography | 박진구 |
