| 2011-11 | Electrochemical Characterization of Anti-Corrosion Film Coated Metal Conditioner Surfaces for Tungsten CMP Applications | 박진구 |
| 2011-10 | Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process | 박진구 |
| 2012-08 | Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process | 박진구 |
| 2011-06 | Enhanced Fluorescence by Controlled Surface Roughness of Plastic Biochip | 박진구 |
| 2011-04 | Enhancement of airborne shock wave by laser-induced breakdown of liquid column in laser shock cleaning | 박진구 |
| 2013-04 | Evaluation of double sided lapping using a fixed abrasive pad for sapphire substrates | 박진구 |
| 2013-01 | Evaluation of very dilute alkaline solutions for wafer cleaning with megasonic irradiation | 박진구 |
| 2013-08 | Fabrication of 3D micro structure by dual diffuser lithography | 박진구 |
| 2012-03 | Fabrication of a hydrophobic/hydrophilic hybrid-patterned microarray chip and its application to a cancer marker immunoassay | 박진구 |
| 2018-04 | Fabrication of high performance copper-resin lapping plate for sapphire: A combined 2-body and 3-body diamond abrasive wear on sapphire | 박진구 |
| 2016-06 | Fabrication of hydrophobic/hydrophilic switchable aluminum surface using poly(N-isopropylacrylamide) | 박진구 |
| 2012-01 | Fabrication of Large-Area CoNi Mold for Nanoimprint Lithography | 박진구 |
| 2013-04 | Fluorocarbon film-assisted fabrication of a CoNi mold with high aspect ratio for nanoimprint lithography | 박진구 |
| 2011-02 | Generation of Pad Debris during Oxide CMP Process and Its Role in Scratch Formation | 박진구 |
| 2013-05 | Hybrid Cleaning Technology for Enhanced Post-Cu/Low-Dielectric Constant Chemical Mechanical Planarization Cleaning Performance | 박진구 |
| 2011-07 | Hydrophobic Modification of Diamond Conditioner for Prevention of Particle Adhesion During Oxide CMP | 박진구 |
| 2017-03 | Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography | 박진구 |
| 2015-03 | Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography | 박진구 |
| 2017-10 | Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle | 박진구 |
| 2012-07 | Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing | 박진구 |
| 2016-09 | Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning | 박진구 |
| 2016-05 | Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process | 박진구 |
| 2015-02 | Investigation of oxide layer removal mechanism using reactive gases | 박진구 |
| 2013-05 | Investigation of Source-Based Scratch Formation During Oxide Chemical Mechanical Planarization | 박진구 |
| 2015-02 | Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates | 박진구 |
| 2015-04 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 박진구 |
| 2013-04 | Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP | 박진구 |
| 2015-03 | Multi-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reduction | 박진구 |
| 2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 박진구 |
| 2011-10 | Nano Gas Cluster Dry Cleaning for Damage Free Particle Removal | 박진구 |
