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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-6 of 6 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach
오혜근
2008-11
A mask generation approach to double patterning technology with inverse lithography
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application
오혜근
2008-08
Ellipsometry for Pellicle-Covered Surface
정희준
2008-08
Ellipsometry for Pellicle-Covered Surface
오혜근
2008-11
A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
정영대
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오혜근
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정영대
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-Subject
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analytical method
1
chemically amplified resist
1
de-protection
1
heat conduction
1
multiscale conductivity and thick...
1
OPTICAL LITHOGRAPHY
1
PEB process
1
post exposure bake
1
Volterra-type integral equations
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