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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-6 of 6 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach
오혜근
2008-11
A mask generation approach to double patterning technology with inverse lithography
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application
오혜근
2008-08
Ellipsometry for Pellicle-Covered Surface
정희준
2008-08
Ellipsometry for Pellicle-Covered Surface
오혜근
2008-11
A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
정영대
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-Author
4
오혜근
1
정영대
1
정희준
-Subject
2
double patterning
2
ellipsometry
2
haze
2
inverse lithography
2
lithography simulation
2
numerical approach
2
pellicle
2
photomask
2
SCATTEROMETRY
1
analytical method
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