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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Title
Author(s)
2008-06
Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)
오혜근
2007-01
Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)
오혜근
2006-02
Numerical modeling of absorber characteristics for EUVL
오혜근
2005-07
Numerical investigation of defect printability in extreme ultraviolet (EUV) reflector: Ru/Mo/Si multilayer system
오혜근
2008-02
The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(
오혜근
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