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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-3 of 3 (Search time: 0.002 seconds).
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2017-06
Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography
오혜근
2016-03
Feasibility of a new absorber material for high NA extreme ultraviolet lithography
오혜근
2016-05
The impact of the residual stress on the EUV pellicle
오혜근
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